File:Bosch process sidewall.jpg
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Summary
| Description |
English: Scanning electron micrograph of the undulating sidewall of a silicon structure fabricated using photolithography and deep reactive-ion etching (Bosch process) |
| Date | |
| Source | Own work |
| Author | Pgalajda |
Licensing
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I, the copyright holder of this work, release this work into the public domain. This applies worldwide. In some countries this may not be legally possible; if so: I grant anyone the right to use this work for any purpose, without any conditions, unless such conditions are required by law. |
File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 21:38, 16 January 2010 | | 712 × 484 (203 KB) | wikimediacommons>Pgalajda | {{Information |Description={{en|1=Scanning electron micrograph of the undulating sidewall of a silicon structure fabricated using photolithography and deep reactive-ion etching (Bosch process)}} |Source={{own}} |Author=Pgalajda |Date=200 |
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