File:Electrocomposeur 1976.JPG

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Description The "Electrocomposeur" vas a rasterscan e-beam lithography machine purposed for maskwriting. Developed by the Thomson-CSF central lab near Paris at the beginning of the 70s, it was installed at Grenoble in the "Sescosem" semiconductor fab in 1976.
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Source Archives CAMECA
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current20:26, 21 April 2007Thumbnail for version as of 20:26, 21 April 20071,128 × 1,353 (140 KB)wikimediacommons>EdC{{Information |Description=The "Electrocompseur" vas a rasterscan e-beam lithography machine purposed for maskwriting. Developped by the Thomson-CSF central lab near Paris at the beginning of the 70's, it was installed at Grenoble in the "Sescosem" semico

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