File:Spinner.jpg

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English: A spinner is used to apply a thin even coating of photoresist to a silicon wafer so that the pattern on a photomask can be transferred and a circuit can be fabricated. The image shows a wafer of 6" (125 mm) diameter that has been mounted on the vacuum chuck and is ready for spinning. The user dispenses a drop of photoresist in the center of the wafer and the centrifugal force spreads the fluid into an even film, eliminating excess photoresist at the edge of the wafer in the process.
Note that the light in the room really is yellow.
Source Photo taken at HP Labs by Alison Chaiken.
Author Alison Chaiken
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I, the copyright holder of this work, hereby publish it under the following licences:
GNU head Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation Licence, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the licence is included in the section entitled GNU Free Documentation Licence.
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This licensing tag was added to this file as part of the GFDL licensing update.
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attribution share alike
This file is licensed under the Creative Commons Attribution-Share Alike 2.5 Generic, 2.0 Generic and 1.0 Generic licence.
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  • to remix – to adapt the work
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exposure time

0.03787878787878787878 second

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8.2 millimetre

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current21:49, 29 November 2014Thumbnail for version as of 21:49, 29 November 2014641 × 823 (63 KB)wikimediacommons>SelakantColour correction and contrast enhancement.

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